Cameca AKONIS

The AKONIS SIMS tool fills a critical gap in semiconductor fabrication processes by providing high throughput, high precision detection for implant profiles, composition analysis and interfacial data to enable high-volume manufacturing. AKONIS provides a very high level of automation to ensure repeatability across tools for fab level process control and tool-to-tool matching.

Complementing the IMS Wf/SC Ultra as well as the SIMS 4550 (quadrupole SIMS) used to support the semiconductor industry via characterization labs, AKONIS – with full automation of instrument set-up and acquisition routines – enables rapid, within-fab analysis without compromise in analytical sensitivity. AKONIS benefits from recent development in EXtremely Low Impact Energy (EXLIE) ionic column technology (< 150 eV), coupled with a full wafer handling system including a high resolution stage enabling measurements on pads down to 20 μm.

The high yield enabler on N5 and beyond:

• High resolution composition and fast dopant depth profiling of SiGe and SiP multilayer stacks
• Unrivalled in pad detection limits down to 20 μm
• More than 97% of time reduction to feedback data to the process line
• Blanket and patterned full wafer measurement
• Pattern recognition engine coupled with high resolution interferometric stage for < 2 μm position accuracy
• Intuitive recipe creation based on unique material database
• SEMI certified (S2/S8, E4, E5, E39, E84…)
• Low cost of ownership