bruker hysitron

Semiconductor wafer
News

Characterising CMP Pads with Nanoindentation

How to use dynamic nanoindentation characterise CMP pads. In this example, the Bruker Hysitron TS 77 Select was employed to quantitatively measure the viscoelastic properties of a hard pad.

This is a robust, reliable method for examining CMP pad surface quality and processes.

Scroll to Top