How to use dynamic nanoindentation characterise CMP pads. In this example, the Bruker Hysitron TS 77 Select was employed to quantitatively measure the viscoelastic properties of a hard pad.
This is a robust, reliable method for examining CMP pad surface quality and processes.
The Bruker TriboLab CMP is a new system for small-scale Chemical Mechanical Wafer Polishing in R&D. It reproduces full-scale wafer polishing process conditions with unique characterisation features. This is a new, updated system replacing the previous CP-4. Blue Scientific is the official Nordic distributor for Bruker Nano surface analysis instruments. For more information please get in […]
